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EUV lithography

Extreme Ultraviolet lithography – an advanced form of photolithography using 13.5 nm wavelength EUV light to pattern extremely small features (~7 nm and below). ASML is the sole provider of EUV lithography scanners, which are critical for the most advanced 5nm/3nm chip production.

7 articles

SemiWiki

Synopsys Explores AI/ML Impact on Mask Synthesis at SPIE 2026

Mar 16, 2026

The SPIE Advanced Lithography + Patterning Symposium recently concluded. This is a popular event where leading researchers gather. Challenges such as optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications are all covered. This… Read More The post Synopsys Explores AI/ML Impact on...

SemiWiki

Unraveling Dose Reduction in Metal Oxide Resists via Post-Exposure Bake Environment

Mar 16, 2026

In the realm of extreme ultraviolet (EUV) lithography, metal oxide resists (MORs) have emerged as promising candidates for advanced semiconductor patterning. However, their stability poses challenges, particularly interactions with clean-room environments like humidity and airborne molecular contaminants (AMCs) … Read More The post Unraveling Dose Reduction in Metal Oxide Resists...

EE Times

IBM, Lam Research Focus High-NA EUV on Sub-1-nm Nodes

Mar 14, 2026

IBM and Lam Research have a five-year agreement focused on developing new materials and fabrication processes. The post IBM, Lam Research Focus High-NA EUV on Sub-1-nm Nodes appeared first on EE Times.

Electronics Weekly

Imec gets the world’s most advanced litho tool

Mar 20, 2026

Imec has received the ASML EXE:5200 High NA EUV lithography system, the most advanced lithography tool available today. The tool gives imec’s partners early access to the next generation of ... The post Imec gets the world’s most advanced litho tool appeared first on Electronics Weekly.

EE Journal

Imec receives the world’s most advanced High NA EUV system

Mar 19, 2026

LEUVEN (Belgium), MARCH 18, 2026— Today, imec, a world-leading research and innovation hub in advanced semiconductor technologies, announces the arrival of the ASML EXE:5200 High NA EUV lithography system, the most advanced lithography tool available today. With this strategic milestone, imec reinforces its position as the industry’s launchpad into the...

Semiconductor Engineering

Exploring The Frontiers Of Lithography And Patterning: Highlights From SPIE Advanced Lithography + Patterning 2026

Mar 19, 2026

High‑NA EUV's reduced field size is driving new innovation in optical proximity correction and mask synthesis. The post Exploring The Frontiers Of Lithography And Patterning: Highlights From SPIE Advanced Lithography + Patterning 2026 appeared first on Semiconductor Engineering.

SemiWiki

Beyond Moore’s Law: High-NA EUV Lithography Redefines Advanced Chip Manufacturing

Mar 23, 2026

The imec installation of the ASML EXE:5200 High Numerical Aperture (High NA) extreme ultraviolet (EUV) lithography system at imec represents a pivotal advancement in semiconductor manufacturing and research. This system, installed in imec’s 300 mm cleanroom in Leuven, Belgium, introduces unprecedented lithographic… Read More The post Beyond Moore’s Law:...

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Hot Topics

EUV lithography

Synopsys Explores AI/ML Impact on Mask Synthesis at SPIE 2026

Unraveling Dose Reduction in Metal Oxide Resists via Post-Exposure Bake Environment

IBM, Lam Research Focus High-NA EUV on Sub-1-nm Nodes

Imec gets the world’s most advanced litho tool

Imec receives the world’s most advanced High NA EUV system

Exploring The Frontiers Of Lithography And Patterning: Highlights From SPIE Advanced Lithography + Patterning 2026

Beyond Moore’s Law: High-NA EUV Lithography Redefines Advanced Chip Manufacturing